US Patent Issued to STMicroelectronics (Crolles 2), STMicroelectronics France on Oct. 28 for "Device and method for generating photomasks" (French, Chilean Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,455,502, issued on Oct. 28, was assigned to STMicroelectronics (Crolles 2) SAS (Crolles, France) and STMicroelectronics France (Montrouge, France).

"Device and method for generating photomasks" was invented by Charlotte Beylier (Meylan, France), Mauricio Garcia Suarez (Santiago, Chile), Pascal Urard (Theys, France) and Guillaume Landie (Lumbin, France).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present description concerns a method that includes the compression, by a processor, of an image comprising first patterns by transforming the image into a first representation formed of two-point elements. The method also includes the execution, by a neur...