US Patent Issued to STATS ChipPAC on April 29 for "PSPI-based patterning method for RDL" (South Korean Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,288,781, issued on April 29, was assigned to STATS ChipPAC Pte. Ltd. (Singapore).

"PSPI-based patterning method for RDL" was invented by ChangOh Kim (Incheon, South Korea) and JinHee Jung (Incheon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device is formed by providing a semiconductor package including a shielding layer and forming a slot in the shielding layer using a laser. The laser is turned on and exposed to the shielding layer with a center of the laser disposed over a first point of the shielding layer. The laser is moved in a loop while the laser remains on and exposed to the shielding layer. Exposure of the laser...