ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,417,910, issued on Sept. 16, was assigned to SPTS Technologies Ltd. (Newport, Great Britain).
"Method of reducing surface roughness" was invented by Roland Mumford (Newport, Great Britain) and Christopher Jonathan W. Bolton (Newport, Great Britain).
According to the abstract* released by the U.S. Patent & Trademark Office: "Surface roughness on a non-planar surface of a silicon substrate with upstanding and/or recessed features can be reduced. A first sequence of plasma processing steps and a second sequence of plasma processing steps can be performed on the silicon substrate to reduce the surface roughness of the upstanding and/or recessed features while retaining these features. T...