ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,426,391, issued on Sept. 23, was assigned to Spectricity (Mechelen, Belgium).

"Hyperspectral filter structure and method of manufacture" was invented by Jonathan Borremans (Lier, Belgium), Ruben Lieten (Heverlee, Belgium), Maarten De Bock (Ghent, Belgium) and Ward van der Tempel (Keerbergen, Belgium).

According to the abstract* released by the U.S. Patent & Trademark Office: "A sensor system includes a plurality of optical sensors implemented in a pixel layer of an integrated circuit and a plurality of sets of optical filters implemented proximal to the pixel layer in a plurality of alternating filter layers. An optical filter of a set of optical filters includes a plurality of filt...