US Patent Issued to South China University of Technology on June 3 for "Harmless and resourceful treatment method for antibiotic residue" (Chinese Inventors)

ALEXANDRIA, Va., June 4 -- United States Patent no. 12,318,726, issued on June 3, was assigned to South China University of Technology (Guangzhou, China).

"Harmless and resourceful treatment method for antibiotic residue" was invented by Weizhen Liu (Guangzhou, China), Shaoyuan Liu (Guangzhou, China), Hongyi Huang (Guangzhou, China), Zhang Lin (Guangzhou, China) and Minlin Mao (Guangzhou, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "A harmless and resourceful treatment method for antibiotic residue includes steps as follows. The antibiotic residue is dried and crushed to obtain a dry powder of antibiotic residue. The dry powder of antibiotic residue is heated to a temperature of 400-800deg C. to perf...