US Patent Issued to SOOCHOW UNIVERSITY on April 1 for "Solvent-resistant polymeric nanofiltration membrane, preparation method and use thereof" (Chinese Inventors)

ALEXANDRIA, Va., April 2 -- United States Patent no. 12,263,444, issued on April 1, was assigned to SOOCHOW UNIVERSITY (Suzhou, China).

"Solvent-resistant polymeric nanofiltration membrane, preparation method and use thereof" was invented by Jian Jin (Suzhou, China) and Zhenggong Wang (Suzhou, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention a solvent-resistant polymeric nanofiltration membrane and preparation method thereof. The method includes subjecting a diamine monomer and a dianhydride monomer to cyclization imidization in a first polar organic solvent at 160 to 230deg C., to form a polyimide, wherein the diamine monomer includes a diamine monomer with a carboxyl group and a diamine m...