ALEXANDRIA, Va., April 9 -- United States Patent no. 12,272,703, issued on April 8, was assigned to Sony Semiconductor Solutions Corp. (Kanagawa, Japan).
"Solid-state imaging element and solid-state imaging element manufacturing method" was invented by Susumu Tonegawa (Kanagawa, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A solid-state imaging element including a semiconductor substrate having a photodiode and a floating diffusion; a capacitor that includes a PD side electrode disposed on a surface of the photodiode opposite to a surface into which the light enters, and an opposite PD side electrode facing the PD side electrode with a dielectric film therebetween; an amplification transistor; and an...