ALEXANDRIA, Va., July 23 -- United States Patent no. 12,366,518, issued on July 22, was assigned to SONY GROUP Corp. (Tokyo).

"Particle analysis system and particle analysis method" was invented by Tomoyuki Umetsu (Tokyo) and Naoki Ide (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A measurement spectrum obtained by irradiating a particle labeled with a plurality of fluorescent dyes with excitation light is separated for each fluorescent dye with high accuracy. Provided is a particle analysis system (1) including a plurality of photodetectors (23) configured to acquire light generated by irradiating a particle labeled with a plurality of fluorescent dyes with excitation light; and an information proce...