ALEXANDRIA, Va., July 16 -- United States Patent no. 12,363,967, issued on July 15, was assigned to Sony Group Corp. (Tokyo).
"Integration methods to fabricate internal spacers for nanowire devices" was invented by Seiyon Kim (Portland, Ore.), Kelin J. Kuhn (Aloha, Ore.), Tahir Ghani (Portland, Ore.), Anand S. Murthy (Portland, Ore.), Mark Armstrong (Portland, Ore.), Rafael Rios (Portland, Ore.), Abhijit Jayant Pethe (Hillsboro, Ore.) and Willy Rachmady (Beaverton, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A nanowire device having a plurality of internal spacers and a method for forming said internal spacers are disclosed. In an embodiment, a semiconductor device comprises a nanowire stack disposed...