US Patent Issued to Solstice Advanced Materials US on Dec. 16 for "Methods for removing water from iodine (I2)" (American, Chinese Inventors)

ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,497,294, issued on Dec. 16, was assigned to Solstice Advanced Materials US Inc. (Morris Plains, N.J.).

"Methods for removing water from iodine (I2)" was invented by Yuon Chiu (Denville, N.J.), Haiyou Wang (Amherst, N.Y.), Haluk Kopkalli (Staten Island, N.Y.), Christian Jungong (Depew, N.Y.), Haridasan K. Nair (Williamsville, N.Y.), Rajiv Ratna Singh (Getsville, N.Y.), Daniel C. Merkel (Orchard Park, N.Y.), Tao Wang (Shanghai), Terris Yang (Amherst, N.Y.) and Richard Wilcox (West Caldwell, N.J.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of removing water from a mixture of iodine (I2) and water includes providing a mixture comprising iodine a...