ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,418,120, issued on Sept. 16, was assigned to Soitec (Bernin, France).
"Structure for radio frequency applications" was invented by Eric Desbonnets (Lumbin, France) and Bernard Aspar (Saint-Ismier, France).
According to the abstract* released by the U.S. Patent & Trademark Office: "A structure for radiofrequency applications includes a high-resistivity support substrate having a front face defining a main plane, a charge-trapping layer disposed on the front face of the support substrate, a first dielectric layer disposed on the charge-trapping layer, an active layer disposed on the first dielectric layer, at least one buried electrode disposed above or in the charge-trapping layer. T...