ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,482,701, issued on Nov. 25, was assigned to Soitec (Bernin, France).
"Method for producing a stacked structure" was invented by Bruno Ghyselen (Seyssinet, France) and Francois-Xavier Darras (Apprieu, France).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for producing a stacked structure comprises: a) providing a carrier substrate and an initial substrate, each having a front face and a back face, b) forming a buried weakened plane in the carrier substrate or in the initial substrate, by implanting light ions through the front face of either of the substrates, c) joining the carrier substrate and the initial substrate via their respective front ...