ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,401,133, issued on Aug. 26, was assigned to SoftBank Corp. (Tokyo).
"Reflection apparatus and system" was invented by Hoyu Lin (Tokyo), Ryuji Kuse (Kumamoto, Japan) and Takeshi Fukusako (Kumamoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A reflection apparatus which reflects a radio wave includes a first device including first units each including a first base body having a first surface and a second surface provided along an emission direction of the reflected wave, a first element provided on the first surface, and a second element provided on the second surface to be shifted in position from the first element in the emission direction, an...