US Patent Issued to Skyworks Solutions on June 10 for "Anchor silicon dioxide layer for piezoelectric microelectromechanical system microphone" (Japanese Inventors)

ALEXANDRIA, Va., June 18 -- United States Patent no. 12,328,562, issued on June 10, was assigned to Skyworks Solutions Inc. (Irvine, Calif.).

"Anchor silicon dioxide layer for piezoelectric microelectromechanical system microphone" was invented by Siarhei Dmitrievich Barsukou (Takarazuka, Japan), Hiroyuki Nakamura (Osaka-Fu, Japan), Keiichi Maki (Suita, Japan), Takanori Yasuda (Nara, Japan) and Ousmane I Barry (Settsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A piezoelectric microelectromechanical system microphone comprises a support substrate, a membrane including a piezoelectric material attached to the support substrate and configured to deform and generate an electrical potential responsive ...