ALEXANDRIA, Va., July 23 -- United States Patent no. 12,368,427, issued on July 22, was assigned to Skyworks Global Pte. Ltd. (Singapore).
"Bulk acoustic wave resonators with patterned mass loading layers" was invented by Kwang Jae Shin (Yongin, South Korea), Jiansong Liu (Fremont, Calif.), Jong Duk Han (Yongin, South Korea), Jae Hyung Lee (Seoul, South Korea), Yiliu Wang (Irvine, Calif.), Yosuke Hamaoka (Suita, Japan), Alexandre Augusto Shirakawa (Cardiff by the Sea, Calif.) and Benfeng Zhang (Moriguchi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Aspects of this disclosure relate to bulk acoustic wave resonators with patterned mass loading layers. Two different bulk acoustic wave resonators of an ...