US Patent Issued to SKY TECH on Sept. 23 for "2-in-1 (UV-assisted and plasma enhanced) ALD and ALE chamber" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,421,600, issued on Sept. 23, was assigned to SKY TECH INC. (Hsinchu County, Taiwan).

"2-in-1 (UV-assisted and plasma enhanced) ALD and ALE chamber" was invented by Jung-Hua Chang (Hsinchu County, Taiwan), Ta-Hao Kuo (Hsinchu County, Taiwan) and Ching-Liang Yi (Hsinchu County, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A UV-assisted and plasma-enhanced process method includes: providing a lower chamber and a reaction space defined therein; providing an upper cover, wherein the upper cover has a window and vent holes; sealing a chamber opening of the lower chamber with the upper cover to form a reaction chamber; providing an outer tube body an...