ALEXANDRIA, Va., July 9 -- United States Patent no. 12,351,940, issued on July 8, was assigned to SK SILTRON Co. LTD. (Gumi-si, South Korea).
"Liner and epitaxial reactor comprising same" was invented by Se Ri Lee (Gumi-si, South Korea) and Seung Chul Back (Gumi-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "According to an aspect of the present disclosure, there is provided a liner of an epitaxial reactor, including a lower body including an entrance stepped portion which is disposed on an upper end of one side of an outer side surface of the lower body and through which a source gas is introduced, a plurality of lower partitions disposed apart from each other on the entrance stepped portion...