ALEXANDRIA, Va., March 26 -- United States Patent no. 12,258,306, issued on March 25, was assigned to SK Innovation Co. Ltd. (Seoul, South Korea) and SK ie technology Co. Ltd. (Seoul, South Korea).
"Diamine, polymer and film produced using the same" was invented by Hyun Kyu Cho (Daejeon, South Korea), Jin Hyung Park (Daejeon, South Korea), Hyo Shin Kwak (Daejeon, South Korea), Seung Min Jeon (Daejeon, South Korea), Jong Chan Kim (Daejeon, South Korea) and Joo Hyun Lee (Daejeon, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a diamine, and a polymer and film produced using the same. Specifically, the diamine may be significantly effectively used as a monomer for pr...