US Patent Issued to SK hynix on Sept. 16 for "Semiconductor device and manufacturing method of a semiconductor device" (South Korean Inventor)

ALEXANDRIA, Va., Sept. 17 -- United States Patent no. 12,419,052, issued on Sept. 16, was assigned to SK hynix Inc. (Icheon-si, South Korea).

"Semiconductor device and manufacturing method of a semiconductor device" was invented by In Su Park (Icheon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes a stack structure, a channel layer passing through the stack structure, a memory layer enclosing the channel layer and including first and second openings which expose the channel layer, a well plate coupled to the channel layer through the first opening, and a source plate coupled to the channel layer through the second opening."

The patent was filed on March 25, 202...