ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,477,736, issued on Nov. 18, was assigned to SK hynix Inc. (Icheon-si, South Korea).
"Semiconductor device and manufacturing method of semiconductor device" was invented by Ki Hong Lee (Icheon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes a gate stack with conductive layers and insulating layers that are stacked alternately with each other, a first channel pattern passing through the gate stack, a second channel pattern coupled to the first channel pattern, the second channel pattern protruding above a top surface of the gate stack, an insulating core formed in the first channel pattern, the insulating cor...