ALEXANDRIA, Va., June 16 -- United States Patent no. 12,310,012, issued on May 20, was assigned to SK hynix Inc. (Icheon-si, South Korea).
"Semiconductor device and method of manufacturing semiconductor device" was invented by Ki Hong Lee (Icheon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes a gate structure including alternately stacked conductive layers and insulating layers, channel structures passing through the gate structure. Each of the conductive layers may include a first portion having a first thickness and a second portion having a second thickness thicker than the first thickness, and the second portion may include a first metal layer, a second met...