ALEXANDRIA, Va., June 16 -- United States Patent no. 12,310,040, issued on May 20, was assigned to SK hynix Inc. (Gyeonggi-do, South Korea).
"Capacitor and method for fabricating the same" was invented by Myung-Soo Lee (Seoul, South Korea), Cheol-Hwan Park (Gyeonggi-do, South Korea) and Chee-Hong An (Gyeonggi-do, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a capacitor having a high dielectric constant and low leakage current and a method for fabricating the same, wherein the capacitor may include a first conductive layer, a second conductive layer, a dielectric layer stack between the first conductive layer and the second conductive layer, a dielectric interface layer between the ...