ALEXANDRIA, Va., June 12 -- United States Patent no. 12,302,569, issued on May 13, was assigned to SK hynix Inc. (Icheon-si, South Korea).

"Semiconductor device and manufacturing method of semiconductor device" was invented by Sun Mi Park (Icheon-si, South Korea), Eun Mee Kwon (Icheon-si, South Korea) and Hyung Jun Yang (Icheon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "There are provided a semiconductor device and a manufacturing method of a semiconductor device. The semiconductor device includes: a gate structure including conductive layers and insulating layers, which are alternately stacked; channel structures penetrating the gate structure, the channel structures being arranged in a ...