US Patent Issued to SK hynix on June 24 for "Semiconductor device and method of forming patterns for a semiconductor device" (South Korean Inventor)

ALEXANDRIA, Va., June 25 -- United States Patent no. 12,341,095, issued on June 24, was assigned to SK hynix Inc. (Icheon-si, South Korea).

"Semiconductor device and method of forming patterns for a semiconductor device" was invented by Dae Sung Eom (Cheongju-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes a first conductive pattern having a first line portion extending in a first direction and a first bending portion that extends from the first line portion. A closed area, surrounded by the first line portion and the first bending portion, is defined at one side of the first line portion. The semiconductor device further includes a second conductive pattern dis...