ALEXANDRIA, Va., Dec. 9 -- United States Patent no. 12,495,591, issued on Dec. 9, was assigned to SK hynix Inc. (Icheon-si, South Korea).
"Semiconductor device and method of manufacturing semiconductor device" was invented by Jin Ha Kim (Icheon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes a stack including alternately stacked conductive films and insulating films, wherein the stack includes an opening penetrating the conductive films and the insulating films, and wherein the stack includes a rounded corner that is exposed to the opening. The semiconductor device also includes a first channel film formed in the opening and including a first curved surface surr...