ALEXANDRIA, Va., June 5 -- United States Patent no. 12,278,193, issued on April 15, was assigned to SK hynix Inc. (Icheon-si Gyeonggi-do, South Korea).
"Semiconductor devices including recognition marks" was invented by Hyun Chul Seo (Icheon-si Gyeonggi-do, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes a first redistribution layer pattern, a second redistribution layer pattern, and a recognition mark. The first redistribution layer pattern is formed on a semiconductor substrate. The second redistribution layer pattern, with a bonding pad portion, is disposed on the first redistribution layer pattern. Furthermore, the recognition mark is formed on the first redistr...