US Patent Issued to SK hynix, INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY on July 22 for "Inductively coupled plasma type ion implanter" (South Korean Inventors)

ALEXANDRIA, Va., July 23 -- United States Patent no. 12,368,021, issued on July 22, was assigned to SK hynix Inc (Icheon, South Korea) and INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY (Seoul, South Korea).

"Inductively coupled plasma type ion implanter" was invented by Jong Jin Hwang (Icheon, South Korea), Sung Mook Jung (Icheon, South Korea) and Seung Jae Moon (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An inductively coupled plasma type ion implanter may include a reaction tube, an induction coil surrounding the reaction tube, an aperture structure arranged over the reaction tube, a showerhead arranged on a lower surface of the reaction tube, a flange arranged under ...