US Patent Issued to SK enpulse on Oct. 28 for "Blank mask and photomask using the same" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,455,501, issued on Oct. 28, was assigned to SK enpulse Co. Ltd. (Pyeongtaek-si, South Korea).

"Blank mask and photomask using the same" was invented by GeonGon Lee (Seoul, South Korea), Suk Young Choi (Seoul, South Korea), Hyung-joo Lee (Seoul, South Korea), Sung Hoon Son (Seoul, South Korea), Seong Yoon Kim (Seoul, South Korea), Min Gyo Jeong (Seoul, South Korea), Taewan Kim (Seoul, South Korea) and Inkyun Shin (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A blank mask including a transparent substrate and a light shielding film disposed on the transparent substrate, wherein the light shielding film includes a transition metal and ...