US Patent Issued to SK enpulse on Jan. 20 for "Laminate for blank mask and manufacturing method for the same" (South Korean Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,529,951, issued on Jan. 20, was assigned to SK enpulse Co. Ltd. (Pyeongtaek-si, South Korea).

"Laminate for blank mask and manufacturing method for the same" was invented by Taewan Kim (Seoul, South Korea), GeonGon Lee (Seoul, South Korea), Sukyoung Choi (Seoul, South Korea), Hyungjoo Lee (Seoul, South Korea), Suhyeon Kim (Seoul, South Korea), Sunghoon Son (Seoul, South Korea), Seongyoon Kim (Seoul, South Korea), Mingyo Jeong (Seoul, South Korea), Hahyeon Cho (Seoul, South Korea) and Inkyun Shin (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A laminate for a blank mask includes a light-transmitting layer; a phase shift film disposed ...