US Patent Issued to SK enpulse, SK HYNIX on Oct. 21 for "Polishing composition for semiconductor process and manufacturing method for polished article" (South Korean Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,448,543, issued on Oct. 21, was assigned to SK enpulse Co. Ltd. (Pyeongtaek-si, South Korea) and SK HYNIX INC. (Icheon-si, South Korea).

"Polishing composition for semiconductor process and manufacturing method for polished article" was invented by Seung Chul Hong (Seoul, South Korea), Deok Su Han (Seoul, South Korea), Jin Hyuk Lim (Icheon-si, South Korea), Donghyun Kim (Icheon-si, South Korea) and Jieun Lee (Icheon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments provide a polishing composition for a semiconductor process facilitating the formation of a microcircuit pattern and minimizing the generation of defects and scratche...