ALEXANDRIA, Va., June 12 -- United States Patent no. 12,301,207, issued on May 13, was assigned to SiTime Corp. (Santa Clara, Calif.).

"Techniques for adding compensating material(s) in semiconductor devices" was invented by Paul M. Hagelin (Saratoga, Calif.) and Charles I. Grosjean (Los Gatos, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A resonant member of a MEMS resonator oscillates in a mechanical resonance mode that produces non-uniform regional stresses such that a first level of mechanical stress in a first region of the resonant member is higher than a second level of mechanical stress in a second region of the resonant member. A plurality of openings within a surface of the resonant member...