US Patent Issued to SILICON WORKS on May 13 for "Electrostatic discharge protection circuit including a first resistor and a second resistor" (South Korean Inventor)

ALEXANDRIA, Va., June 12 -- United States Patent no. 12,302,644, issued on May 13, was assigned to SILICON WORKS Co. LTD. (Daejeon, South Korea).

"Electrostatic discharge protection circuit including a first resistor and a second resistor" was invented by Min Cheol Kong (Daejeon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An electrostatic discharge (ESD) protection circuit includes a plurality of transistors each including a gate terminal, a drain terminal, and a source terminal, a first connection line connected to the drain terminals of the plurality of transistors, a second connection line connected to the source terminals of the plurality of transistors, a third connection line connected ...