ALEXANDRIA, Va., July 3 -- United States Patent no. 12,344,531, issued on July 1, was assigned to Sil'Innov Srcl (Courcelles, Belgium).

"Silica with ultra-fast dissolution properties" was invented by Nicolas Mannu (Waterloo, Belgium), Quentin Chevrot (La Fare les Oliviers, France), Karine Croizet-Berger (Court St Etienne, Belgium), Nicolas Rabasso (Antony, France), Ivan Coste-Maniere (Grasse, France), Jullen Estager (Kontich, Belgium) and Benoit Kartheuser (Ciney, Belgium).

According to the abstract* released by the U.S. Patent & Trademark Office: "Mesoporous silicas with ultra-fast dissolution properties, compositions thereof methods of preparation thereof, and methods of use thereof. Mesoporous silicas with ultra-fast dissolution proper...