US Patent Issued to SIKA TECHNOLOGY on Jan. 28 for "Polyurethane composition having a low content of monomeric diisocyantes" (Swiss Inventors)

ALEXANDRIA, Va., Jan. 29 -- United States Patent no. 12,209,157, issued on Jan. 28, was assigned to SIKA TECHNOLOGY AG (Baar, Switzerland).

"Polyurethane composition having a low content of monomeric diisocyantes" was invented by Michael Schlumpf (Stallikon, Switzerland), Sven Reimann (Zurich, Switzerland) and Berzad Durmic (Zufikon, Switzerland).

According to the abstract* released by the U.S. Patent & Trademark Office: "A blocked amine as curing aid for polymers containing isocyanate groups and having a low monomeric diisocyanate content, obtained from the reaction of at least one monomeric diisocyanate with at least one polyol in an NCO/OH ratio of at least 3/1, followed by removal of a majority of the monomeric diisocyanates by means ...