US Patent Issued to SIKA TECHNOLOGY on Dec. 16 for "Polyurea composition with a low content in monomeric diisocyanates" (British Inventors)

ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,497,510, issued on Dec. 16, was assigned to SIKA TECHNOLOGY AG (Baar, Switzerland).

"Polyurea composition with a low content in monomeric diisocyanates" was invented by Jordan Holmes (Huddersfield, Great Britain), Alison Thomson (Preston, Great Britain), Stephen Glover (Chorley, Great Britain), Michelle Round (Leyland, Great Britain), Alexander Coward (Sale, Great Britain), Mark Gatrell (Chipping Preston, Great Britain) and Mike Byrne (Lytham, Great Britain).

According to the abstract* released by the U.S. Patent & Trademark Office: "A polyurea composition containing monomeric diisocyanates in an amount of max. 0.5 wt. % and consisting of a first component containing a primary, aroma...