US Patent Issued to Sigray on Sept. 30 for "X-ray analysis system with focused x-ray beam and non-x-ray microscope" (California Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,429,436, issued on Sept. 30, was assigned to Sigray Inc. (Benicia, Calif.).

"X-ray analysis system with focused x-ray beam and non-x-ray microscope" was invented by Benjamin Donald Stripe (Berkeley, Calif.), Wenbing Yun (Walnut Creek, Calif.) and Janos Kirz (Berkeley, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus includes an x-ray optic system configured to receive x-rays from an x-ray source, to focus at least some of the x-rays to form a focused x-ray beam, and to irradiate a portion of a sample with the focused x-ray beam. The focused x-ray beam has a depth-of-focus and a focused x-ray spot at the sample. The apparatus further i...