US Patent Issued to Sigray on April 15 for "Microfocus x-ray source for generating high flux low energy x-rays" (California Inventors)

ALEXANDRIA, Va., June 5 -- United States Patent no. 12,278,080, issued on April 15, was assigned to Sigray Inc. (Benicia, Calif.).

"Microfocus x-ray source for generating high flux low energy x-rays" was invented by Wenbing Yun (Walnut Creek, Calif.) and Janos Kirz (Berkeley, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An x-ray source includes an x-ray transmissive window having an x-ray transmittance greater than or equal to 20% for at least some x-rays having an x-ray energy less than 1 keV. The x-ray source further includes an electron source configured to generate at least one electron beam and an anode assembly configured to generate x-rays in response to electron bombardment by at least some ...