ALEXANDRIA, Va., Aug. 20 -- United States Patent no. 12,393,169, issued on Aug. 19, was assigned to Siemens AG (Munich).
"Method and apparatus for monitoring industrial devices" was invented by Hans-Henning Klos (Weigendorf, Germany), Vladimir Lavrik (Dreieich, Germany) and Christoph Paulitsch (Karlsruhe, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for monitoring of industrial devices includes: receiving sensor signal data of one or more industrial devices and one or more events associated with the operation of the one or more industrial devices. The method further includes: identifying, (e.g., using a first autoencoder), an abnormal behavior of the one or more industrial devices based on...