US Patent Issued to Siemens Industry Software on Sept. 9 for "Optical proximity correction based on combining inverse lithography technology with pattern classification" (California, Nevada, New York Inventors)

ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,411,405, issued on Sept. 9, was assigned to Siemens Industry Software Inc. (Plano, Texas).

"Optical proximity correction based on combining inverse lithography technology with pattern classification" was invented by Yuansheng Ma (Fremont, Calif.), Le Hong (Benicia, Calif.), Rui Wu (Clifton Park, N.Y.) and Junjiang Lei (Reno, Nev.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Various aspects of the present disclosed technology relate to techniques for inverse-lithography-technology-based optical proximity correction. A layout design is received. A machine learning-based clustering process is then performed to separate layout features in the layout desi...