US Patent Issued to Siemens Industry Software on Nov. 25 for "Wafer image defect detection and characterization for manufacturing process calibration" (American, Belgian Inventors)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,482,090, issued on Nov. 25, was assigned to Siemens Industry Software Inc. (Plano, Texas).

"Wafer image defect detection and characterization for manufacturing process calibration" was invented by Kiarash Ahi (San Jose, Calif.), Germain Louis Fenger (Gladstone, Ore.) and Hsin-Wei Wu (Heverlee, Belgium).

According to the abstract* released by the U.S. Patent & Trademark Office: "A computing system implementing a raw data filtering tool can aggregate multiple wafer images depicting a portion of an electronic device into a reference image, detect one or more of the wafer images have defects based on a comparison of the reference image to the wafer images, and generate a gauge file to in...