US Patent Issued to SHOEI CHEMICAL on July 15 for "Semiconductor nanoparticle complex, semiconductor nanoparticle complex dispersion liquid, semiconductor nanoparticle complex composition, semiconductor nanoparticle complex cured film, and purification method for semiconductor nanoparticle complex" (Japanese Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,359,123, issued on July 15, was assigned to SHOEI CHEMICAL INC. (Tokyo).

"Semiconductor nanoparticle complex, semiconductor nanoparticle complex dispersion liquid, semiconductor nanoparticle complex composition, semiconductor nanoparticle complex cured film, and purification method for semiconductor nanoparticle complex" was invented by Makoto Kido (Tosu, Japan), Takafumi Moriyama (Tosu, Japan) and Hirokazu Sasaki (Tosu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a semiconductor nanoparticle complex in which a ligand is coordinated to a surface of a semiconductor nanoparticle. The semiconductor nanoparticle includes In and P, the l...