ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,429,767, issued on Sept. 30, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).
"Resist composition and patterning process" was invented by Jun Hatakeyama (Joetsu, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A resist composition comprising a base polymer and a sulfonium or iodonium salt of a fluorinated sulfonic acid having a phenylene group which is substituted with an iodized phenyl-containing group and a nitro group is provided. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone."
The patent was filed on April 21, 2022, under Application No...