ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,429,771, issued on Sept. 30, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).
"Resist composition and pattern forming process" was invented by Jun Hatakeyama (Joetsu, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A resist composition comprising a base polymer and an acid generator in the form of a sulfonium or iodonium salt of a fluorinated sulfonic acid having a phenylene group which is substituted with a fluorinated cyclic group and a nitro group is provided. The resist composition offers a high sensitivity, reduced LWR and improved CDU independent of whether it is of positive or negative tone."
The patent was filed on April 20, 2022, und...