US Patent Issued to SHIN-ETSU CHEMICAL on Sept. 30 for "Chemically amplified resist composition, photomask blank, method for forming resist pattern, and method for producing polymer compound" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,429,772, issued on Sept. 30, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Chemically amplified resist composition, photomask blank, method for forming resist pattern, and method for producing polymer compound" was invented by Keiichi Masunaga (Joetsu, Japan), Kenji Funatsu (Joetsu, Japan), Masaaki Kotake (Joetsu, Japan) and Naoya Inoue (Joetsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A chemically amplified resist composition contains (A) a polymer compound containing one or two or more kinds of repeating units, at least one kind of the repeating units is polymerized from a polymerizable monomer with not more than 1000 ppm of a res...