US Patent Issued to SHIN-ETSU CHEMICAL on Sept. 23 for "Positive resist composition and pattern forming process" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,422,751, issued on Sept. 23, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Positive resist composition and pattern forming process" was invented by Jun Hatakeyama (Joetsu, Japan) and Masahiro Fukushima (Joetsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A positive resist composition is provided comprising a base polymer comprising repeat units having a carboxy group whose hydrogen is substituted by a nitrobenzene ring-containing tertiary hydrocarbyl group. The resist composition has a high sensitivity and resolution and forms a pattern of good profile with reduced edge roughness and size variation after exposure."

The patent was file...