ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,449,730, issued on Oct. 21, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).
"Resist composition and patterning process" was invented by Jun Hatakeyama (Joetsu, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A resist composition comprising a base polymer and a quencher is provided. The quencher is a salt compound obtained from a nitrogen-containing compound having an iodine-substituted aromatic ring bonded to the nitrogen atom via a C1-C20 hydrocarbon group which may contain an ester bond and/or an ether bond and a fluorinated 1,3-diketone compound, fluorinated Beta-keto ester compound or fluorinated imide compound. The resist composition has ...