US Patent Issued to SHIN-ETSU CHEMICAL on Oct. 14 for "Composition for forming organic film, patterning process, and compound and polymer for forming organic film" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,443,104, issued on Oct. 14, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Composition for forming organic film, patterning process, and compound and polymer for forming organic film" was invented by Daisuke Kori (Joetsu, Japan), Yasuyuki Yamamoto (Joetsu, Japan) and Naoki Kobayashi (Joetsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention is a composition for forming an organic film, containing: a material for forming an organic film shown by the following general formula; and an organic solvent, where R1 represents a hydrogen atom, an allyl group, or a propargyl group, R2 represents a nitro group, a halogen atom, a hyd...