US Patent Issued to Shin-Etsu Chemical on Nov. 18 for "Pellicle frame, pellicle, exposure original plate with pellicle, exposure method, and semiconductor or liquid-crystal-display manufacturing method" (Japanese Inventor)

ALEXANDRIA, Va., Nov. 18 -- United States Patent no. 12,474,631, issued on Nov. 18, was assigned to Shin-Etsu Chemical Co. Ltd. (Tokyo).

"Pellicle frame, pellicle, exposure original plate with pellicle, exposure method, and semiconductor or liquid-crystal-display manufacturing method" was invented by Akinori Nishimura (Annaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides a pellicle frame, a pellicle, an exposure original plate with the pellicle, an exposure method, and a semiconductor or liquid-crystal-display manufacturing method, the pellicle frame constituting a pellicle for photolithography."

The patent was filed on Jan. 15, 2021, under Application No. 17/793,462....