ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,468,224, issued on Nov. 11, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).
"Resist composition and patterning process" was invented by Jun Hatakeyama (Joetsu, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A resist composition comprising a base polymer and a quencher is provided. The quencher is a salt compound obtained from a nitrogen-containing compound having an iodized or brominated hydrocarbyl group (exclusive of iodized or brominated aromatic ring) bonded to the nitrogen atom via an ester bond-containing group and a fluorinated 1,3-diketone compound, fluorinated Beta-keto ester compound or fluorinated imide compound. The resist composi...