US Patent Issued to SHIN-ETSU CHEMICAL on March 4 for "Onium salt, chemically amplified resist composition and patterning process" (Japanese Inventors)

ALEXANDRIA, Va., March 5 -- United States Patent no. 12,240,804, issued on March 4, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Onium salt, chemically amplified resist composition and patterning process" was invented by Takayuki Fujiwara (Joetsu, Japan), Satoshi Watanabe (Joetsu, Japan) and Kousuke Ohyama (Joetsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition forms a pattern having minimal defects and excellent lithography performance factors such as CDU, LWR and DOF."...